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Plasma and Radio Frequency Systems, Components, Services - Aurion Anlagentechnik GmbH

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Cluster and Inline Systems. RF systems for particle accelerators. Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available. Plasma Systems for the deposition of thin films from the gas phase. Plasma Systems for the deposition of thin films by means of sputtering processes. Atmospheric Pressure Plasma Sources. Unique Integration of electrical supply and plasma generation. Aurion is certified for DIN EN 9001:2008.

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Plasma and Radio Frequency Systems, Components, Services - Aurion Anlagentechnik GmbH | aurionag.com Reviews

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Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Cluster and Inline Systems. RF systems for particle accelerators. Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available. Plasma Systems for the deposition of thin films from the gas phase. Plasma Systems for the deposition of thin films by means of sputtering processes. Atmospheric Pressure Plasma Sources. Unique Integration of electrical supply and plasma generation. Aurion is certified for DIN EN 9001:2008.

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Plasma and Radio Frequency Systems, Components, Services - Aurion Anlagentechnik GmbH | aurionag.com Reviews

https://aurionag.com

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Cluster and Inline Systems. RF systems for particle accelerators. Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available. Plasma Systems for the deposition of thin films from the gas phase. Plasma Systems for the deposition of thin films by means of sputtering processes. Atmospheric Pressure Plasma Sources. Unique Integration of electrical supply and plasma generation. Aurion is certified for DIN EN 9001:2008.

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aurionag.com

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Microwave - Aurion Anlagentechnik GmbH

http://www.aurionag.com/microwave.html

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Compact systems, minimized footprint. High plasma densities for short process times. Optimized homogeneity by plasma-array with 2-dimensional gas inlet system. 10 x 0.8 x 1.8 m. Up to 4 mass flow controllers with a flow rate of up to 500 sccm each. 2 kW, pulsed 4 kW. Sterilization and Barrier Coating. Get free well advised. Tel 49(0) 6182 96 28 -0. Fax 49(0) 6182 96 28 -16. Your Name or Company *. Your Phone number: *. Trade Fairs and Events.

2

Plasmatechnology = Plasma systems + HF-Components - Aurion Anlagentechnik GmbH

http://www.aurionag.com/aurion-gmbh-en.html

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Plasma technology = Plasma systems RF-Components. AURION Anlagentechnik GmbH was founded by three shareholders at the end of 1996 in order to produce components and complete systems for surface treatment that are efficient, costreducing and ecologically desirable. AURION is located in Seligenstadt, a small town a few miles east of Frankfurt am Main. Therefore we are easy to reach by plane, train or car. Business Division RF Components. Based on...

3

Plasma processes - Aurion Anlagentechnik GmbH

http://www.aurionag.com/plasma-processes.html

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. In only two decades plasma processes have evolved to almost versatile tools for industrial applications. Plasma is used to manage a lot of tasks in surface treatment, i.e. coating, activation of polymers, etching of micro electronic components and cleaning. But what is plasma technology? In addition, one can use the radiation of a plasma. By this attribute it is often called 'burning plasma'. The emission covers the range from vacuum ul...Activ...

4

Overview - Aurion Anlagentechnik GmbH

http://www.aurionag.com/overview.html

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Overview of our RF Components. Impedance matching networks (PRODIK-Series):. Power range: 300 W to 30 kW. Various circuits for different applications available (L-, T-, Pi-, N). Output currents of up to 300 A for capacitive loads of extremely low impedance. Cathode switching of up to 60 A. Cost-effective simultaneous operation of two or more cathodes with one power supply. Transmission and connection technique:. 2 channel or 6 channel.

5

Plasma and Radio Frequency Systems, Components, Services - Aurion Anlagentechnik GmbH

http://www.aurionag.com/index.en.html

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available. Plasma Systems for the deposition of thin films from the gas phase. Plasma Systems for the deposition of thin films by means of sputtering processes. Atmospheric Pressure Plasma Sources. Unique Integration of electrical supply and plasma generation. Multi chamber plasma systems with substrate handling (PVD, RIE, PECVD). Aurion is certified for DIN EN 9001:2008.

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Plasma and Radio Frequency Systems, Components, Services - Aurion Anlagentechnik GmbH

Trade Fairs and Events. Atmospheric Pressure Plasma Sources. Cluster and Inline Systems. RF systems for particle accelerators. Plasma Systems for Reactive Ion Etching, wide variety of chamber layouts available. Plasma Systems for the deposition of thin films from the gas phase. Plasma Systems for the deposition of thin films by means of sputtering processes. Atmospheric Pressure Plasma Sources. Unique Integration of electrical supply and plasma generation. Aurion is certified for DIN EN 9001:2008.

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