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RASIRC
Jeffrey Spiegelman
7815 Sil●●●●●●●● Suite 2
San●●●ego , CA, 92126
US
View this contact
RASIRC
Jeffrey Spiegelman
7815 Sil●●●●●●●● Suite 2
San●●●ego , CA, 92126
US
View this contact
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Dynamic Gas Generation | RASIRC | rasirc.com Reviews
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Ultra Pure Steam: RASIRC Technology | RASIRC
http://www.rasirc.com/resources/whitepapers.htm
White Papers / Technical Papers. Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition, Annealing, and Surface Cleaning in Semiconductor Processing. Jeffrey Spiegelman, Russ Holmes and Zohreh Shamsi. Particle Generation by Incomplete Vaporization of Condensable Fluids and Particle Prevention by Membrane Pervaporation. Jeffrey Spiegelman, Daniel Alvarez, Russ Holmes. Anhydrous Hydrogen Peroxide Gas Delivery for Atomic Layer Deposition. D Alvarez, Jr., J. Spiegelman. Steam Delivery Into Vacuum. Inline...
H2O2 Vaporizers for thin film ALD | RASIRC
http://www.rasirc.com/products/h2o2vaporizers.htm
Hydrogen Peroxide Gas Delivery. RASIRC offers a line of products designed to deliver high concentration hydrogen peroxide (H2O2) gas to semiconductor manufacturing processes. H2O2 is well known for its superior oxidizing capabilities. Now H2O2 is available in high concentration. H2O2 gas is ideal for next generation materials and 3d architectures that are temperature and water sensitive. For High Concentration H2O2 Gas. Learn more about the Peroxidizer. Or request additional information. BRUTE Peroxide d...
RainMaker Humidification System (RHS) | RASIRC
http://www.rasirc.com/products/rainmaker-hs.htm
The RainMaker Humidification System (RHS) is the first and only system to generate and deliver precise amounts of ultra pure water vapor purified for both ionic contaminants and dissolved gases. Related Paper: Particle Generation by Incomplete Vaporization of Condensable Fluids and Particle Prevention by Membrane Pervaporation. A very low cost solution when compared to vaporizers or Direct Liquid Injection. Delivery into vacuum, ambient and positive pressure. Purification of DI water source.
UltraPure Steam for Solar Cells | RASIRC
http://www.rasirc.com/applications/solar.htm
UltraPure Steam for Solar Cells. Ultrapure steam can be used to form the transparent conductive oxide that improves solar energy capture. Steam is also used to grow wet thermal thick oxides on the backside for state of the art current isolation in backside contacts. In addition, steam can be used to form isolation layers between films and annealing of films to reduce defects and improve cell efficiencies. RASIRC technology improves many processes within the solar industry:. Application Sheet - Solar.
Steamers | RASIRC
http://www.rasirc.com/products/steamers.htm
RASIRC Steamers have been obsoleted and are no longer sold after August 1, 2016. July 21, 2016. RASIRC Presents Two New Molecules for Growth of Low Temperature Nitrides and Oxides at ALD Conference. June 23, 2016. RASIRC Releases Technical Report on Hydrogen Peroxide Gas Delivery for ALD, Annealing and Cleaning in Semiconductor Processes. June 22, 2016. Bald Engineering Blog: Hydrogen Peroxide Gas Delivery for ALD, Annealing, and Surface Cleaning in Semiconductor Processing. June 7, 2016. May 31, 2016.
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Travel
http://eurocvd-balticald2017.se/home/travel.html
Travel to Linköping, Sweden. The meeting will be organized at the Konsert och Kongress venue in the heart of the city with walking distance to all hotels. Linköping is easily reached via direct flights from Amsterdam and train from Copenhagen Kastrup Airport, alternatively is Stockholm Arlanda airport just two hours by train. 1 Full name as it appears on passport. 2 Date of Birth. 5 Conference booking number (from your conference registration). 6 Do you want a printed version [yes/no]. Phone: 46 13 281385.
Venue
http://eurocvd-balticald2017.se/home/venue.html
Venue - Konsert and Kongress. The meeting will be organized at the Konsert och Kongress venue in the heart of the city with walking distance to all hotels. The main sessions will be held in. N and Lunches, refreshments, poster sessions and show booths in. As a back up also the. Department of Physics, Chemistry and Biology (IFM) / Chemistry (KEMI). Phone: 46 13 281385. Mobile: 46 73 69 11 572. Hash Tags for Twitter.
Scientific Committee
http://eurocvd-balticald2017.se/home/scientific%20committee.html
Henrik Pedersen, Linköping University, Sweden. Jonas Sunqvist, TU Dreseden/Lund University, Germany/Sweden. Sean Barry, Carleton University, Canada. Mats Boman, Uppsala University, Sweden. Ray Adomaitis, University of Maryland, USA. Markku Leskelä, University of Helsinki, Finland. Jaan Aarik, Tartuu University, Estoina. Kaupo Kukli, Tartuu University, Estoina. Martyn Pemble, Tyndall Institute, Ireland. Mato Knez, nanoGune, Spain. Anjana Devi, Ruhr-Bochum University, Germany. Phone: 46 13 281385.
Bold Stroke
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Blogs, Posts, Tweets. Bold Stroke will not distribute your contact information to anyone at any time. See our privacy policy. If you have a web site, we can help you improve it. If you need a web site, we can help build it. We have helped many companies craft their message, organize their content, design their web site and decorate it with effective images. Located in San Diego, Bold Stroke serves clients around the world.
BALD Engineering - Born in Finland, Born to ALD: ALD Products
http://www.blog.baldengineering.com/p/ald-products.html
BALD Engineering - Born in Finland, Born to ALD. ALD News on Twitter. ALD / CVD Precursor Report 2016. Please contact me if you want to display your ALD Products here : jonas.sundqvist@baldengineering.com. Subscribe to: Posts (Atom). NCD CO., LTD. Strem Chemicals, Inc.,. Syria - Donate now! View my complete profile. ALD - Atomic Layer Deposition Group on LinkedIn. Created: April 5, 2009. Group Members: 2,714 (February 22, 2015). Join The ALD Group! ALC Atomic Layer Cleaning. ALD - Atomic Layer Deposition.
BALD Engineering - Born in Finland, Born to ALD: Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma
http://www.blog.baldengineering.com/2016/12/grow-low-temperature-nitrides-by-atomic.html
BALD Engineering - Born in Finland, Born to ALD. ALD News on Twitter. ALD / CVD Precursor Report 2016. Wednesday, December 14, 2016. Grow Low Temperature Nitrides by Atomic Layer Deposition Without Plasma. Unique Hydrazine formulation and package enables HAR and 3D film studies for Laboratories. At ALD Lab Saxony. RASIRC BRUTE Hydrazine - Laboratory Version is specifically designed for universities and research institutes in development of Atomic Layer Deposition and Etch (ALD and ALE) processes with com...
BALD Engineering - Born in Finland, Born to ALD: ALD Services
http://www.blog.baldengineering.com/p/ald-services.html
BALD Engineering - Born in Finland, Born to ALD. ALD News on Twitter. ALD / CVD Precursor Report 2016. This is a new section of the BALD Blog. Please contact me if you want to display your ALD services here : jonas.sundqvist@baldengineering.com. Thin as a Service™. Atomic layer deposition, ALD, enables completely new innovative products and improves traditional ones with coatings that would not be possible with any other technology. Thin as a Service™. The second option for ALD production is to outsource...
Welcome
http://eurocvd-balticald2017.se/index.html
Welcome to the Joint EuroCVD 21 Baltic ALD 15 Conference Linköping, Sweden, 11 14 June, 2017. Abstract submission is now open. Abstracts can be submitted by following the Abstract Submission link in the menu. Topics for this conference include:. Precursors (design, synthesis and delivery). Modelling (surface, gas phase, thermo chemistry, quantum chemistry, multi scale). Energy Enhanced processes (Plasma, Hot wire, Photon). Nanomaterials (particles, 2D-materials, nano structures). Phone: 46 13 281385.
Sponsors | UCPSS 2016
http://www.ucpss.com/sponsors
Skip to main content. Download the Sponsorship Invitation. Direct Line: 32 9 218 85 85. September 8, 2016: Deadline Online Registration. Please fill out your e-mail address to stay informed on all conference updates.
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Dynamic Gas Generation | RASIRC
Specializes in products that generate and deliver gas to fabrication processes. Each unit is a. Dynamic gas plant in a box. Mdash;converting common liquid chemistries into safe and reliable gas flow for most processes. First to generate ultra-high purity (UHP) steam from de-ionized water, RASIRC technology can now also deliver hydrogen peroxide gas in controlled, repeatable concentrations. For high concentration hydrogen peroxide gas. For water-free hydrogen peroxide gas. For ultra high purity steam.
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